Characterization of a d.c. titanium tetraisopropoxide/H2N2 plasma using emission spectroscopy
Identifieur interne : 001D20 ( Main/Exploration ); précédent : 001D19; suivant : 001D21Characterization of a d.c. titanium tetraisopropoxide/H2N2 plasma using emission spectroscopy
Auteurs : B. Kuz Lakowska-Pawlak [Pologne] ; W. Yrnicki [Pologne]Source :
- Thin Solid Films [ 0040-6090 ] ; 1995.
English descriptors
- Teeft :
- Cathode temperature, Chemical composition, Deposition, Deposition temperature, Discharge power, Emission intensities, Emission intensity, Experimental conditions, Gaseous mixture, Gaseous phase, Glow discharge, Hard coatings, Mass spectroscopy, Molecular spectra, Nitrogen emission, Optical emission spectroscopy, Other hand, Pacvd, Pacvd processes, Plasma, Plasma chemistry, Plasma processes, Plasma reactions, Process parameters, Reactant gases, Reaction chamber, Sample temperature, Solid films, Spectral lines, Titanium, Titanium tetraisopropoxide, Titp, Titp flow, Titp fragmentation, Total pressure.
Abstract
Abstract: The analysis of the gaseous phase of a d.c. plasma-assisted chemical vapour deposition plasma operating with a (TiTP)H2 N2 mixture has been performed by optical emission spectroscopy. Highly energetic components of plasma have been identified. A correlation between the emission intensities of excited species in the plasma and cathode temperature and composition of the gaseous mixture has been studied.
Url:
DOI: 10.1016/0040-6090(95)06636-5
Affiliations:
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Yrnicki</name></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:646177AE1F8984F372AED8D84C603C6C35803B4C</idno><date when="1995" year="1995">1995</date><idno type="doi">10.1016/0040-6090(95)06636-5</idno><idno type="url">https://api.istex.fr/ark:/67375/6H6-V8DTBC3J-D/fulltext.pdf</idno><idno type="wicri:Area/Istex/Corpus">001142</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">001142</idno><idno type="wicri:Area/Istex/Curation">001142</idno><idno type="wicri:Area/Istex/Checkpoint">000A95</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">000A95</idno><idno type="wicri:doubleKey">0040-6090:1995:Kuz Lakowska Pawlak B:characterization:of:a</idno><idno type="wicri:Area/Main/Merge">001D94</idno><idno type="wicri:Area/Main/Curation">001D20</idno><idno type="wicri:Area/Main/Exploration">001D20</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a">Characterization of a d.c. titanium tetraisopropoxide/H2N2 plasma using emission spectroscopy</title><author><name sortKey="Kuz Lakowska Pawlak, B" sort="Kuz Lakowska Pawlak, B" uniqKey="Kuz Lakowska Pawlak B" first="B." last="Kuz Lakowska-Pawlak">B. Kuz Lakowska-Pawlak</name><affiliation wicri:level="1"><country xml:lang="fr">Pologne</country><wicri:regionArea>Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wrocław Technical University, Wyb. Wyspiańskiego 27, 50-370 Wrocław</wicri:regionArea><wicri:noRegion>50-370 Wrocław</wicri:noRegion></affiliation></author><author><name sortKey=" Yrnicki, W" sort=" Yrnicki, W" uniqKey=" Yrnicki W" first="W." last=" Yrnicki">W. Yrnicki</name><affiliation wicri:level="1"><country xml:lang="fr">Pologne</country><wicri:regionArea>Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wrocław Technical University, Wyb. Wyspiańskiego 27, 50-370 Wrocław</wicri:regionArea><wicri:noRegion>50-370 Wrocław</wicri:noRegion></affiliation></author></analytic><monogr></monogr><series><title level="j">Thin Solid Films</title><title level="j" type="abbrev">TSF</title><idno type="ISSN">0040-6090</idno><imprint><publisher>ELSEVIER</publisher><date type="published" when="1995">1995</date><biblScope unit="volume">266</biblScope><biblScope unit="issue">1</biblScope><biblScope unit="page" from="8">8</biblScope><biblScope unit="page" to="13">13</biblScope></imprint><idno type="ISSN">0040-6090</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0040-6090</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="Teeft" xml:lang="en"><term>Cathode temperature</term><term>Chemical composition</term><term>Deposition</term><term>Deposition temperature</term><term>Discharge power</term><term>Emission intensities</term><term>Emission intensity</term><term>Experimental conditions</term><term>Gaseous mixture</term><term>Gaseous phase</term><term>Glow discharge</term><term>Hard coatings</term><term>Mass spectroscopy</term><term>Molecular spectra</term><term>Nitrogen emission</term><term>Optical emission spectroscopy</term><term>Other hand</term><term>Pacvd</term><term>Pacvd processes</term><term>Plasma</term><term>Plasma chemistry</term><term>Plasma processes</term><term>Plasma reactions</term><term>Process parameters</term><term>Reactant gases</term><term>Reaction chamber</term><term>Sample temperature</term><term>Solid films</term><term>Spectral lines</term><term>Titanium</term><term>Titanium tetraisopropoxide</term><term>Titp</term><term>Titp flow</term><term>Titp fragmentation</term><term>Total pressure</term></keywords></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Abstract: The analysis of the gaseous phase of a d.c. plasma-assisted chemical vapour deposition plasma operating with a (TiTP)H2 N2 mixture has been performed by optical emission spectroscopy. Highly energetic components of plasma have been identified. A correlation between the emission intensities of excited species in the plasma and cathode temperature and composition of the gaseous mixture has been studied.</div></front></TEI><affiliations><list><country><li>Pologne</li></country></list><tree><country name="Pologne"><noRegion><name sortKey="Kuz Lakowska Pawlak, B" sort="Kuz Lakowska Pawlak, B" uniqKey="Kuz Lakowska Pawlak B" first="B." last="Kuz Lakowska-Pawlak">B. Kuz Lakowska-Pawlak</name></noRegion><name sortKey=" Yrnicki, W" sort=" Yrnicki, W" uniqKey=" Yrnicki W" first="W." last=" Yrnicki">W. Yrnicki</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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